photonic drying pulsed light as a low lomperature

All-photonic drying and sintering process via flash white

Photonic drying (NIR 80 °C) and deep UV-assisted flash white light sintering process developed in this study (flash white light 12.5 J/cm 2 1 pulse 10 ms deep UV power 30 mW/cm 2) yielded highly conductive Cu films at room temperature under ambient conditions in a few milliseconds. Photonic drying (NIR 80 °C) and deep UV-assisted flash white light sintering process developed in this study (flash white light 12.5 J/cm 2 1 pulse 10 ms deep UV power 30 mW/cm 2) yielded highly conductive Cu films at room temperature under ambient conditions in a few milliseconds.

Photonic Sintering of Silver for Roll-to-Roll Printed

∗ Low temperature ∗ Produces high energy pulsed light which has a very short duration (few us to few ms) ∗ Have comparatively high conversion efficiency. ∗ This allows the use of low temperature substrates like paper or plastic ∗ Simple to implement and use ∗ No scanning laser no rolling plasma no oven ∗ Pulse rate can be

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Photonic Curing as Means for ConvertingCopper Oxide to

The photonic curing process uses pulsed light from a flashlamp to thermally process a thin film. The thin film printed on a low temperature substrate is heated by a brief but very intense pulse of light from a flashlamp. If the pulse of light is short enough the thin film can be heated to a temperature far beyond Dec 01 2014 · Pilot tests of the HfO 2 photonic curing revealed that the pulse condition yielding the best results was achieved by using an engineered pulse profile (shaped pulse) rather than a single pulse. In short a single pulse of light with sufficient power and radiant exposure to affect the film failed the substrate by inducing surface cracks or in

Ultra-low threshold gallium nitride photonic crystal

Ultra-low threshold gallium nitride photonic crystal nanobeam laser Nan Niu 1 a) Alexander Woolf 1 Danqing Wang 1 Tongtong Zhu 2 Qimin Quan 3 Rachel A. Oliver 2 and Evelyn L. Hu1 1School of Engineering and Applied Sciences Harvard University Cambridge Massachusetts 02138 USA 2Department of Materials Science and Metallurgy University of Cambridge 27 Charles Babbage Road Schematics of the photonic drying and sintering The application of intense pulsed light (IPL) to printed copper nanoparticle (CuNP) films enables rapid curing on low temperature substrates in

IEEE PHOTONICS TECHNOLOGY LETTERS VOL. 18 NO. 3

interesting potential as light sources in dense chip-scale optical systems. Many designs of the photonic crystal laser cav-ities have been demonstrated 1 6 but there are a limited number of reports of room-temperature continuous-wave (CW) operation 4 7 . In this letter we report on a method to deter- In the developing field of printed electronics nanoparticle based inks such as CuO show great promise as a low-cost alternative to other metal-based counterparts (e.g. silver). In particular CuO inks significantly eliminate the issue of particle oxidation before and during the sintering process that is prevalent in Cu-based formulations. We report here the scalable and low-thermal-budget

Photonic curing of solution-deposited ZrO 2 dielectric on

Apr 27 2020 · Using 20 µs to 20 ms light pulses from a broad spectrum (200–1500 nm) xenon flash lamp photonic curing can heat a thin film to several hundred degrees over a Mar 18 2010 · An ordered GaN nanopillar array fabricated by nanosphere lithography exhibited room temperature photopumped lasing via the photonic crystal band-edge effect. With a monolayer of self-assembled nanospheres as hard mask the ordered pattern was transferred to the sample to form nanopillars by inductively coupled plasma dry etch. Under pulsed optical excitation room temperature lasing with a low

Time-resolved lasing action from single and coupled

quantum wells QWs emitting at 940–980 nm with a pulse duration of 7 ps full width at half maximum FWHM at low temperature7 and a pulse duration shorter than 4 ps at room temperature.8 There has been particular interest in PC lasers emitting in the transparency window of standard tele-communication fiber near 1550 nm.9–11 We have recently ad- tems and integrated photonic circuits the research on two-dimensional 2D photonic crystal defect lasers has been at-tracting increasing attention. Single-defect photonic crystal lasers were first demonstrated in pulsed mode at low temperatures.1 Room-temperature pulsed operation has since been demonstrated in lasers with larger mode volumes

Room temperature photonic crystal band-edge lasing from

photopumped lasing via the photonic crystal band-edge effect. With a monolayer of self-assembled nanospheres as hard mask the ordered pattern was transferred to the sample to form nanopillars by inductively coupled plasma dry etch. Under pulsed optical excitation room temperature lasing with a low lasing threshold of 30 mJ/cm2 was achieved ∗ Low temperature ∗ Produces high energy pulsed light which has a very short duration (few us to few ms) ∗ Have comparatively high conversion efficiency. ∗ This allows the use of low temperature substrates like paper or plastic ∗ Simple to implement and use ∗ No scanning laser no rolling plasma no oven ∗ Pulse rate can be

Photonic Sintering of Silver for Roll-to-Roll Printed

∗ Low temperature ∗ Produces high energy pulsed light which has a very short duration (few us to few ms) ∗ Have comparatively high conversion efficiency. ∗ This allows the use of low temperature substrates like paper or plastic ∗ Simple to implement and use ∗ No scanning laser no rolling plasma no oven ∗ Pulse rate can be photopumped lasing via the photonic crystal band-edge effect. With a monolayer of self-assembled nanospheres as hard mask the ordered pattern was transferred to the sample to form nanopillars by inductively coupled plasma dry etch. Under pulsed optical excitation room temperature lasing with a low lasing threshold of 30 mJ/cm2 was achieved

Effect of photonic flash annealing with subsequent

The photonic annealing simulation software gave an indicative peak temperature of 307 °C which corresponded with a TGA mass loss of 71 and 90 for ink and dry resin respectively. Although the thermal profiles of the two techniques are dissimilar this suggests that photonically annealing the prints could lead to a significant reduction in the Schematics of the photonic drying and sintering The application of intense pulsed light (IPL) to printed copper nanoparticle (CuNP) films enables rapid curing on low temperature substrates in

Photonic Quantum Ring Laser of Whispering Cave Mode

The photonic quantum ring (PQR) laser is an attractive candidate for high-density "laser" displays given the unique operating characteristics attendant on its quantum-wire-like nature such as extremely low threshold currents and thermally stable spectra in the typical operating-temperature range.Overview

Lasers incorporating 2D photonic bandgap mirrors

photonic lattice is a 2D hexagonal close-packed array with a lattice constant of 220nm. Pulsed threshold currents of llOmA were observed from a 180 laser. Photonic bandgap crystals are expected to be of use in defining microcavities for modifying spontaneous emission and as highly reflective mirrors. Dec 01 2014 · Pilot tests of the HfO 2 photonic curing revealed that the pulse condition yielding the best results was achieved by using an engineered pulse profile (shaped pulse) rather than a single pulse. In short a single pulse of light with sufficient power and radiant exposure to affect the film failed the substrate by inducing surface cracks or in

Lasers incorporating 2D photonic bandgap mirrors

photonic lattice is a 2D hexagonal close-packed array with a lattice constant of 220nm. Pulsed threshold currents of llOmA were observed from a 180 laser. Photonic bandgap crystals are expected to be of use in defining microcavities for modifying spontaneous emission and as highly reflective mirrors. to verify the well-behaved wetting and drying properties of the ink on each substrate. As Adv. Mater. 2015 27 6683–6688 advmat MaterialsViews Figure 1. Inkjet printing and intense pulsed light (IPL) annealing of graphene. a) Atomic force microscopy image of graphene fl akes inset image of graphene ink vial. b) Schematic illus-

Photonic Curing Equipment High-Tech in Korea

Features. Precisely control irradiation light of our proprietary high XENON lamp high power short pulse irradiation. Even on a substrate with low heat resistance without damaging it. Momentarily heat the surface only to high temperature dry and bake (annealing). Photonic drying (NIR 80 °C) and deep UV-assisted flash white light sintering process developed in this study (flash white light 12.5 J/cm 2 1 pulse 10 ms deep UV power 30 mW/cm 2) yielded highly conductive Cu films at room temperature under ambient conditions in a few milliseconds.

Self-Reducing Copper Precursor Inks and Photonic Additive

Printing conducting copper interconnections on plastic substrates is of growing interest in the field of printed electronics. Photonic curing of copper inks with intense pulsed light (IPL) is a promising process as it is very fast and thus can be incorporated in roll-to-roll production. We report on using IPL for obtaining conductive patterns from inks composed of submicron particles of copper Photonic curing is the high-temperature thermal processing of a thin film using pulsed light from a flash lamp. When this transient processing is done on a low-temperature substrate such as plastic or paper it is possible to attain a significantly higher temperature

EmpaCoating Competence CenterPhotonic Curing

Photonic curing is the high temperature thermal processing of a thin film using pulsed light from a xenon flash lamp. When this transient processing is done on a low temperature substrate such as plastic or paper it is possible to attain a significantly higher temperature than the substrate can ordinarily withstand in a conventional oven. The photonic annealing simulation software gave an indicative peak temperature of 307 °C which corresponded with a TGA mass loss of 71 and 90 for ink and dry resin respectively. Although the thermal profiles of the two techniques are dissimilar this suggests that photonically annealing the prints could lead to a significant reduction in the

USA1Photonic Crystals for Thermal Insulation

The invention relates to photonic crystals which have units having a refractive index of greater than 3 and units having a refractive index of less than 1.6 in a periodic sequence and separations of the individual units of from 1 to 20 μm and also to the use of these photonic crystals. Photonic drying (NIR 80 °C) and deep UV-assisted flash white light sintering process developed in this study (flash white light 12.5 J/cm 2 1 pulse 10 ms deep UV power 30 mW/cm 2) yielded highly conductive Cu films at room temperature under ambient conditions in a few milliseconds.

Mechanisms of photonic curing™ Processing high

Using 20 µs to 20 ms light pulses from a broad spectrum ( nm) xenon flash lamp photonic curing can heat a thin film to several hundred degrees over a short time while maintaining the Features. Precisely control irradiation light of our proprietary high XENON lamp high power short pulse irradiation. Even on a substrate with low heat resistance without damaging it. Momentarily heat the surface only to high temperature dry and bake (annealing).